Fabricate at the microscale with
Lithography Systems
Enhance your production with precision holographic mastering and lithography systems.
The Firefly® platform consists of a family of high-precision optical lithography systems designed to engrave diffractive patterns, microstructures, and Optical Variable Devices (OVDs) onto photoresist-coated optical substrates.
The resulting photoresist masters serve as generation matrices for electroforming, embossing, and holographic foil production, enabling advanced optical security features and diffractive optical components.
Firefly systems are used for applications including:
- security holograms and authentication labels
- diffractive optical elements (DOE)
- optical variable devices (OVD)
- packaging and branding holography
- scientific and industrial microstructures
The Firefly platform is organized into two system families:
- Holographic Mastering Systems (HMS) — optimized for holographic origination and security holography
- Microlithography Systems (MLS) — flexible maskless lithography platforms for research and advanced microstructure fabrication
All Firefly systems operate with the Firefly Holographic Design Software (HDS) and the Project Manager Tools, enabling optical effect design, project preparation, and lithography control.
Available Products
Holographic Mastering Systems (HMS)
Firefly Holographic Mastering Systems produce high-precision holographic masters used in the fabrication of security holograms, optical variable devices (OVDs), and advanced diffractive imagery.
These systems support applications in authentication technologies, packaging features and branding elements, and artistic and visual holography requiring complex microstructured optical elements.
The Firefly HMS family includes multiple systems optimized for different mastering workflows, from research and prototype development to large-scale industrial hologram production.
Neo
The Firefly Neo is a high-resolution microlithography mastering system designed for security hologram development, research environments, and small-format holographic production.
Despite its compact footprint, the Neo platform supports the full library of Firefly holographic optical effects, allowing engineers and designers to develop complex diffractive imagery and optical security features.
Its precision and flexibility make it ideal for R&D laboratories, prototype development, and small-area mastering workflows where accuracy and effect complexity are more important than production speed.
Typical applications include:
- security hologram development
- optical effect prototyping
- small-format holographic labels
- diffractive optics experimentation
| Mapping Grid Resolution | 235,000 dpi (470,000 dpi in 2X exposure mode) |
| Operation Wavelength | 405 nm |
| Spot Size (FWHM) | 375 nm |
| Translation Stage Travel | 120 mm × 120 mm |
| Plate Size | Up to 8" × 8" |
| Origination Speed | Up to 1.5 cm²/hour (1X exposure mode) |
| Diffraction Grating Pitch | > 800 nm |
| Focusing System | Smart optoelectronic auto-focusing system |
| Remote Diagnostics | Remote Monitoring & Fault Diagnosis Service (RM&FDS) via Internet for 1 year |
| Mapping Grid Resolution | 25,400 dpi |
| Operation Wavelength | 405 nm |
| Spot Size (FWHM) | < 500 nm |
| Maximum Plate Size | 300 × 300 mm up to 1300 × 1000 mm |
| Origination Speed | Up to 50 cm²/hour |
| Diffraction Grating Pitch | > 1000 nm |
| Focusing System | Smart optoelectronic auto-focusing system |
| Motion Technology | Air-bearing translation stages |
| Recommended Photoresist Thickness | 1.5 µm standard up to 10 µm plates |
| Remote Diagnostics | Remote Monitoring & Fault Diagnosis Service (RM&FDS) via Internet for 1 year |
Cheetah
The Firefly Cheetah is the most versatile and powerful system in the Firefly family.
It combines high resolution, very large working areas, and high writing speeds, allowing the production of complex diffractive holograms at industrial scale.
Cheetah systems are capable of producing the full range of holographic optical effects, including complex diffractive imagery, security holograms, and multi-layer optical designs.
Its large working areas allow diffractive elements to be integrated into large printing formats used in packaging, branding, and security foil production.
Typical applications include:
- large-format security holograms
- packaging holography
- holographic foils
- complex OVD security devices
Air-bearing motion technology enables high precision positioning and improved image quality during hologram origination.
Purchase this system →Dragonfly
The Firefly Dragonfly is a high-speed lithography system designed for large-format optical imagery and packaging applications.
Dragonfly systems are optimized for producing very large holographic images quickly, making them ideal for branding, packaging graphics, and large visual holography elements.
The Firefly-Dragonfly® line is limited to simple achromatic optical effects and microtext/microimage security features. It cannot produce high-frequency diffractive rainbow effects or colored holographic imagery.
Typical applications include:
- large packaging holograms
- branding holographic graphics
- achromatic holographic imagery
- high-speed production of large masters
| Mapping Grid Resolution | 25,400 dpi |
| Operation Wavelength | 450 nm |
| Spot Size (FWHM) | < 1 µm |
| Translation Stage Travel | 500 × 500 mm or 800 × 800 mm |
| Origination Speed | Up to 55 cm²/hour |
| Diffraction Grating Pitch | > 5000 nm |
| Focusing System | Smart optoelectronic auto-focusing system |
| Recommended Photoresist Thickness | 1.5 µm standard up to 10 µm plates |
| Remote Diagnostics | Remote Monitoring & Fault Diagnosis Service (RM&FDS) via Internet for 1 year |
Optical Effects
Firefly microlithographic systems can generate a wide range of optical and holographic effects used in security and visual holography.
Layered holographic compositions allow multiple effects to be combined while maintaining independent brightness control and optical behavior, enabling complex designs and advanced security features.
Rainbow Effects
Classic diffractive holographic imagery.
Examples include:
- photographic holographic images (constant depth)
- depth-map based 3D photo effects
- multiplexed 3D imagery
- animated holographic sequences
Kinetic Effects
Dynamic optical patterns that change with viewing angle.
Examples include:
- kinematic image animation
- sparkle effects
- pillars of light
- contrast flip
- rotational flip
Achromatic Diffractive Effects
Structures that create white or monochrome optical effects without rainbow diffraction.
Examples include:
- spherical Fresnel lenses
- engraved relief imagery
- white kinetic imagery
- wave-lens patterns
- sand-blasted surface textures
- zone plate structures
Security Features
Advanced optical security elements.
Examples include:
- Laser Readable Images — holographic content designed to be machine-verified with a laser
- Floating Images — optical elements that appear to hover above the surface
- Microtext / Microimages — extremely small and intricate authentication structures
Advanced Holographic Effects
High-complexity holographic optical structures.
Examples include:
- SpectraBlend — constant-depth photographic holograms with vivid color fidelity and visual characteristics similar to analog holography
- SpectraBlend PolyBeam — multi-view holographic imagery with enhanced parallax and animation
- ZeroView White — zero-diffraction-order holograms with single or dual-parallax imagery
- MicroOptix White — advanced microlens-based holographic optical effects
Available Products
Microlithography Systems (MLS)
Firefly Microlithography Systems (MLS) extend the Firefly platform beyond holographic origination, providing flexible maskless lithography systems for laboratory microfabrication and experimental device development.
Using precision photoresist exposure and high-resolution positioning systems, these platforms allow researchers to pattern complex microstructures on photoresist-coated substrates without the need for traditional photomasks.
This maskless workflow enables rapid design iteration and experimental fabrication for a wide range of scientific, photonic, and microengineering applications, making the Firefly platform a versatile lithography tool for research laboratories and advanced R&D environments.
Firefly® Research Edition — Laboratory Microlithography Platform
The Firefly Research Edition (Firefly-RE) is a configurable microlithography system designed for academic laboratories, research institutes, and advanced R&D environments.
In this configuration, the Firefly platform operates without the holography-specific design software and functions as a general-purpose maskless lithography system for microstructure patterning and experimental device prototyping.
Its combination of high precision, flexible pattern generation, and large writing areas makes it suitable for a wide range of laboratory microfabrication tasks.
Typical Applications:
- microelectronic circuit prototyping
- microfluidic channel fabrication
- MEMS device research
- sensor and microdetector structures
- microscopy calibration targets
- micro-patterned surfaces for experimental materials research
- photonic device prototyping
- custom microstructure fabrication
Research Advantages:
- maskless lithography workflow, eliminating photomask fabrication costs
- rapid design iteration for experimental device development
- high-resolution microstructure patterning
- flexible pattern generation for complex structures
- large writing areas suitable for prototype and pilot production work
Firefly System Comparison
The Firefly lithography platform includes multiple systems optimized for different holographic origination and microlithography workflows.
| System | Primary Role | Optical Effects Capability | Maximum Area | Speed | Typical Applications |
|---|---|---|---|---|---|
| Firefly Neo | Compact-Format High-Definition | Full holographic effect library | 120 × 120 mm | Up to 1.5 cm²/h | Security hologram development, small-format mastering, optical effect R&D |
| Firefly Cheetah | High-Speed Security Capabilities | Full holographic effect library | Up to 1300 × 1000 mm | Up to 50 cm²/h | Security holograms, holographic foil production, packaging holography |
| Firefly Dragonfly | Large-Format Packaging Oriented | Achromatic effects + microtext only | Up to 800 × 800 mm | Up to 55 cm²/h | Packaging graphics, branding holography, large visual holographic elements |
| Firefly Research Edition | Maskless Lithography Platform | General-purpose maskless patterning (no holographic effects) | 120 × 120 mm | Up to 1.5 cm²/h | Microelectronics prototyping, microfluidic fabrication, MEMS research, experimental device development |
Systems & Outputs
Examples of Firefly systems and holographic origination outputs.
Acquire a Firefly System
CI Photonics works closely with customers to specify the appropriate Firefly system configuration, including installation, training, and technical support.